Er 3+ Doping conditions of planar porous silicon waveguides

A. Najar, N. Lorrain, H. Ajlani, J. Charrier, M. Oueslati, L. Haji

Research output: Contribution to journalReview articlepeer-review

17 Citations (Scopus)

Abstract

EDX and infrared photoluminescence (IR PL) analyses performed on erbium-doped porous silicon waveguides (PSWG) were studied using different doping conditions. Both parameters of the cathodisation electrochemical method used for Er incorporation and parameters of thermal treatments required for Er optical activation were taken into consideration. Firstly, by varying the current density and the time of cathodisation, we have shown that a current density of 0.1 mA/cm 2 for 10 min allows homogeneous Er doping to be achieved throughout the depth of the guiding layer. Then, the PL intensity at 1.53 μm was studied as a function of the oxidation time at 900 °C and Er diffusion temperature for 60 min. Increasing the oxidation time up to 1 h allows PL to be enhanced due to active Si-O-Er complex formation whereas an oxidation time of 2 h induces a decrease in PL because of Er segregation. Moreover, an increase in the diffusion temperature induces an optimal distribution of optically active Si-Er-O complexes inside the crystallites. When the temperature is too high, a PSWG densification and Er segregation occurs inducing a decrease in PL due to energy transfer phenomena.

Original languageEnglish
Pages (from-to)581-586
Number of pages6
JournalApplied Surface Science
Volume256
Issue number3
DOIs
Publication statusPublished - Nov 15 2009
Externally publishedYes

Keywords

  • EDX
  • Er doping
  • IR photoluminescence
  • Porous silicon
  • Waveguides

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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