Concurrent synthesis and boron-doping of amorphous carbon films by focused ion beam-assisted chemical vapor deposition

Ryo Matsumoto, El Hadi S. Sadki, Hiromi Tanaka, Sayaka Yamamoto, Shintaro Adachi, Adnan Younis, Hiroyuki Takeya, Yoshihiko Takano

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Amethod to directly deposit boron-doped amorphous carbon films via focused ion beam-assisted chemical vapor deposition is reported. The presence of boron in the deposited films was verified by X-ray photoelectron spectroscopy. Raman spectroscopy analysis confirmed the amorphousity of the films. The as-deposited films exhibited typical semiconducting behavior from electrical resistance versus temperature measurements. The presented fabrication technique is a one step process for the simultaneous deposition, boron-doping, and patterning of the films, and hence may offer an effective way to directly fabricate boron-doped amorphous carbon-based devices without the need for templates, which is highly advantageous for applications.

Original languageEnglish
Article number138704
JournalThin Solid Films
Volume730
DOIs
Publication statusPublished - Jul 31 2021

Keywords

  • Amorphous carbon film
  • Boron doping
  • Chemical vapor deposition
  • Focused ion beam

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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